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Metal Oxide Thin Films: Synthesis, Characterization and Applications
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This Special Issue will compile recent developments in the field of metal oxide thin film deposition. The articles presented in this Special Issue will cover various topics, ranging from, but not limited to, the optimization of deposition methods, thin film preparations, the functionalization of surfaces with targeted applications, nanosensors, catalysis, electronic devices, biocidal coating, and the synthesis of nanostructures via the accurate control of thin film deposition methods, among others. Topics are open to metal oxide thin film deposition and characterization for the development of applications.
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Keywords
- ALD
- Aluminum
- aluminum-zinc oxide
- anodizing
- atmospheric pressure chemical vapour deposition transport properties
- atomic layer deposition
- bismuth ferrite
- carrier gas
- Cellulose
- charge carrier mobility
- Crystallography
- device performance
- dynamic hot-probe measurements
- electrical characteristic
- epitaxy
- gadolinium cobaltites
- high-aspect-ratio substrate
- History of engineering & technology
- IGZO TFTs
- impedance spectroscopy
- indium-tin oxide
- ions adsorption
- La-doping
- low-temperature fabrication
- magnetoresistance
- magnetron co-sputtering
- MAO (micro-arc oxidation) coating
- Materials science
- Mechanical engineering & materials
- metal oxide thin films
- mist chemical vapor deposition (mist-CVD)
- n/a
- NiTiO3
- oxidation
- ozone
- piezoelectricity
- plasma electrolytic oxidation
- preferential crystal growth orientation
- self-lubricating
- SEM
- sol–gel
- Stability
- Technology, engineering, agriculture
- Technology: general issues
- Thin films
- tin oxide
- transparent semiconductor
- tribological performance
- wide-bandgap semiconductor
- α-Ga2O3
- β-diketonates
Links
DOI: 10.3390/books978-3-0365-1057-6Editions