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Advanced Pulse Laser Machining Technology

Advanced Pulse Laser Machining Technology

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This reprint is the printed edition of the Special Issue published in Materials. The reprint provides an overview on current international research activities in the field of advanced pulse laser machining technology. It covers fundamental and applied aspects and collects contributions of renowned scientists from academics and industries working in the fields of laser processing, materials science, physics, chemistry, and engineering in order to foster the current knowledge and present new ideas for future applications and new technologies.

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Keywords

  • additive manufacturing
  • ambient dose rate
  • amorphization
  • atomic force microscopy
  • beam shaping
  • beam splitting
  • bearing steel
  • Bessel beam
  • bi-burst
  • Biochemistry
  • Biology, Life Sciences
  • bremsstrahlung
  • burst
  • burst processing
  • central composite design
  • Crystallization
  • Design of experiments
  • diffusion competition effects
  • digital manufacturing
  • direct laser interference patterning
  • dose rate
  • double pulses
  • dual laser beam processing
  • electro-optic modulator shutter
  • element redistribution
  • excited state absorption
  • femtosecond laser
  • fs-laser
  • fs-laser writing
  • GHz bursts
  • Glass
  • Industrial applications
  • invar
  • laser
  • laser ablation
  • laser micromachining
  • Laser printing
  • laser surface structuring
  • laser-induced forward transfer (LIFT)
  • laser-induced periodic surface structures
  • lifetime
  • Mathematics & science
  • mechanical shutter
  • MHz bursts
  • micro structuring
  • micro-channels
  • micromachining
  • morphological filtering
  • multi-beam micromachining
  • n/a
  • nanosecond laser
  • OLED
  • opening time
  • Plasma
  • printing of materials
  • protection housing
  • pulsed laser
  • Radiation Protection
  • re-deposition
  • Reference, information & interdisciplinary subjects
  • Research & information: general
  • resonance absorption
  • semiconducting thin films
  • shadow masks
  • Silicon
  • solenoid shutter
  • Soret effect
  • spectroscopic imaging ellipsometry
  • squared top-hat
  • stimulated emission depletion
  • surface texture homogeneity
  • transmission electron microscopy
  • ultra-short pulses
  • ultrafast
  • ultrafast laser
  • ultrafast laser processing
  • ultrashort pulse
  • ultrashort pulsed laser
  • waveguides
  • X-ray
  • X-ray dose rate
  • X-ray emission
  • X-ray emission hazards
  • X-ray energies
  • X-ray spectrum

Links

DOI: 10.3390/books978-3-0365-6633-7

Editions

edition cover

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