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Fundamentals and Recent Advances in Epitaxial Graphene on SiC

Fundamentals and Recent Advances in Epitaxial Graphene on SiC

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This book is a compilation of recent studies by recognized experts in the field of epitaxial graphene working towards a deep comprehension of growth mechanisms, property engineering, and device processing. The results of investigations published within this book develop cumulative knowledge on matters related to device-quality epaxial graphene on SiC, bringing this material closer to realistic applications.

This book is included in DOAB.

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Keywords

  • 2D peak line shape
  • 3C-SiC on Si
  • AFM
  • atomic layer deposition
  • buffer layer
  • carrier concentration
  • charge density
  • chronoamperometry
  • Copper
  • deposition
  • DFT
  • electrodeposition
  • electronic properties
  • epitaxial graphene
  • epitaxial graphene on SiC
  • flat band
  • free charge carrier properties
  • G peak
  • Graphene
  • high-k insulators
  • high-temperature sublimation
  • intercalation
  • ion implantation
  • Material Engineering
  • mobility
  • monolayer graphene
  • quasi-free-standing graphene
  • Raman
  • Raman spectroscopy
  • redox reaction
  • SIC
  • silicon carbide
  • strain
  • sublimation
  • substrate interaction
  • Surface functionalization
  • Technology, engineering, agriculture
  • Technology: general issues
  • terahertz optical Hall effect
  • twisted bilayer graphene
  • twistronics
  • Voltammetry
  • XPS

Links

DOI: 10.3390/books978-3-0365-1178-8

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